|
|
| BEST OF ASMC
|
|
 |
|
|
|
|
|
|
|
|
|
|
|
|
|
|
| Scheduling for Backend Manufacturing with SPTB Heuristic Smallest Bit-Line Contact of 76nm pitch on NAND Flash Cell by using Reversal
PR (Photo Resist) and SADP (Self-Align Double Patterning) Process Byungjoon Hwang, Jaehwang Shim, Jang-Ho Park, Kwangseok Lee, Sunghyun Kwon, Sang-Yong Park,
Yoonmoon Park, Dong-Hwa Kwak, Jaekwan Park and Won-Seong Lee; Samsung Electronics Co., Ltd.
|
|
|
|
| Smallest Bit-Line Contact of 76nm pitch on NAND Flash Cell Smallest Bit-Line Contact of 76nm pitch on NAND Flash Cell by using Reversal
PR (Photo Resist) and SADP (Self-Align Double Patterning) Process Byungjoon Hwang, Jaehwang Shim, Jang-Ho Park, Kwangseok Lee, Sunghyun Kwon, Sang-Yong Park,
Yoonmoon Park, Dong-Hwa Kwak, Jaekwan Park and Won-Seong Lee; Samsung Electronics Co., Ltd.
|
|
|
|
| Yield Learning Methodology in Early Technology Development Xu Ouyang, David Riggs, Ishtiaq Ahsan, Oliver D. Patterson, Dallas M. Lea, Benjamin
Ebersman, IBM; Katherine V. Hawkins, IBM; Keith Miller, KLA-Tencor; Stephen Fox, IBM; James Rice, IBM
|
|
|
|
|
|
|
|
|
| Strategic Business Conference
|
|
|
|
|
|
|
|
|
|